Aluminum Sec-Butoxide | Al(OsBu)₃ for Advanced Precursor Chemistry & Catalysis

Precision in Molecular Design: A Tailored Precursor for Demanding Applications

In the sophisticated arena of advanced material synthesis and fine chemical production, the choice of precursor dictates the purity, morphology, and ultimate performance of the final product. Aogochem Aluminum Sec-Butoxide [Al(OCH(CH₃)C₂H₅)₃] represents a specialized organoaluminum reagent engineered for applications where precise control over reaction kinetics and product properties is non-negotiable. As a member of the aluminum alkoxide family, it shares the core reactivity of its analogs—namely, controlled hydrolysis to form metal-oxygen networks—but offers distinct advantages due to its sec-butoxy ligand structure. The increased carbon chain length and branching modify its solubility, volatility, and hydrolysis rate compared to the more common isopropoxide, providing chemists and materials scientists with a valuable tool for tuning sol-gel processes and deposition parameters. This compound is indispensable for the synthesis of ultra-high-purity, nano-structured aluminas with tailored porosity, serving as a premier precursor for thin films, ceramic powders, and specialized catalyst supports. Furthermore, its potent Lewis acidity makes it an effective catalyst in selective organic transformations. Aogochem delivers this sensitive reagent in high-purity grades, ensuring reliability and consistency for R&D and industrial processes that demand exacting standards in materials science and synthetic chemistry.

Technical Specifications & Distinctive Properties

Our Aluminum Sec-Butoxide is characterized by its specific organic ligand and stringent purity controls.

Core Physical & Chemical Properties:

• Chemical Formula: Al[OCH(CH₃)C₂H₅]₃ | Al(OC₄H₉)₃

• CAS Number: 2269-22-9

• Appearance: Colorless to pale yellow viscous liquid or low-melting solid. Often supplied as a solution in an appropriate organic solvent (e.g., sec-butanol, hydrocarbons) for easier handling.

• Purity: Typically ≥ 97% to 99%, with trace metal impurities minimized for critical applications.

• Molecular Weight: 246.33 g/mol

• Boiling Point/Decomposition: Decomposes before boiling at atmospheric pressure.

• Density: ~0.967 g/cm³ (at 20°C for liquid forms)

• Solubility: Soluble in common organic solvents such as benzene, toluene, alcohols (like parent sec-butanol), and chlorinated hydrocarbons. Reacts vigorously with protic solvents like water and lower alcohols.

• Sensitivity: Highly moisture-sensitive and air-sensitive. Requires handling under inert atmosphere to prevent uncontrolled hydrolysis and degradation.

• Key Comparative Advantages:

• Controlled Hydrolysis Kinetics: The bulkier sec-butoxy group hydrolyzes at a different, often more controllable rate than the isopropoxy group in aluminum isopropoxide. This allows for finer manipulation of sol-gel conditions, leading to more uniform particle sizes and pore structures in derived aluminas.

• Enhanced Solubility/Volatility Profile: Its different organic moiety can offer advantages in specific solvent systems or in vapor deposition precursor formulations where volatility is a factor.

Targeted Applications in Advanced Technology

1. Advanced Material Precursor via Sol-Gel Route (Primary Use):

• Use: As a high-purity molecular precursor for the synthesis of specialty alumina materials. Controlled hydrolysis and condensation yield sols of aluminum sec-butoxide-derived oxyhydroxides (e.g., pseudo-boehmite).

• Process Benefits: The modified hydrolysis rate allows for excellent control over the nucleation and growth of alumina nanoparticles, facilitating the production of sols with exceptional stability and narrow particle size distribution.

• End Products: High-purity gamma-alumina (γ-Al₂O₃) catalyst supports with defined pore architectures, transparent alumina ceramics, nanopowders for polishing, and thin ceramic coatings for optical or protective applications via dip-coating or spin-coating.

2. Precursor for Chemical Vapor Deposition (CVD) & Atomic Layer Deposition (ALD):

• Use: As a potential aluminum source in MOCVD or ALD processes for depositing thin films of aluminum oxide (Al₂O₃) on semiconductors, optics, or barrier layers. Its volatility and decomposition pathway can be suitable for specific deposition system requirements.

• Benefit: Enables the growth of high-quality, conformal, and pinhole-free Al₂O₃ films used as gate dielectrics, passivation layers, or diffusion barriers in microelectronics.

3. Catalyst in Organic Synthesis:

• Use: As a Lewis acid catalyst in organic reactions, similar to other aluminum alkoxides. It can catalyze:

• Transesterification reactions for modifying esters.

• Ring-opening polymerizations of cyclic esters (e.g., lactones) to produce polyesters.

• Other condensation and coupling reactions where a mild, tunable Lewis acid is beneficial.

• Benefit: Offers an alternative reactivity profile to other aluminum alkoxides, which can influence reaction selectivity and yield in sensitive syntheses.

4. Intermediate in Organometallic Chemistry & Synthesis:

• Use: As a starting material for preparing other organoaluminum compounds or for surface modification of inorganic materials, where its alkoxide groups can exchange with surface hydroxyls.

Why Choose Aogochem Aluminum Sec-Butoxide?

• Specialized Reactivity Profile: We provide this specific alkoxide for researchers and process engineers who need the unique hydrolysis kinetics and solubility properties it offers, enabling innovations in material microstructure that other precursors cannot achieve.

• Guaranteed Purity for Reproducible Results: Consistency in precursor purity is critical for reproducible sol-gel behavior and final material properties. Our quality assurance ensures reliable performance batch after batch.

• Expertise in Handling Sensitive Organometallics: We understand the stringent handling requirements and offer the product in secure, appropriate packaging (often under inert gas or as solutions) to ensure it arrives ready for use in your controlled environment.

• Technical Support for Precursor Chemistry: Our team can provide basic guidance on standard handling procedures and typical applications, supporting your development efforts.

Handling, Storage & Safety Protocols

CRITICAL: Aluminum Sec-Butoxide is highly moisture-sensitive, air-sensitive, and flammable.

• Handling: Must be handled and transferred under an inert atmosphere (argon or nitrogen) using Schlenk line techniques or in a glovebox. Contact with moisture in air will cause hydrolysis, forming aluminum hydroxides and sec-butanol.

• Storage: Store in a tightly sealed, moisture-proof container under an inert atmosphere, in a cool (<25°C), dry, well-ventilated area away from heat, sparks, and open flame.

• Reactivity: Reacts exothermically with water, alcohols, and acids. Appropriate safety measures must be in place.

• Personal Protective Equipment (PPE): Always use appropriate PPE, including chemical safety goggles, gloves, and a lab coat. Conduct a thorough risk assessment and consult the Safety Data Sheet (SDS) prior to use.

Access the precision of tailored precursor chemistry. Contact Aogochem's technical sales team to discuss your specific application needs, request product specifications, or inquire about custom packaging and solution concentrations for Aluminum Sec-Butoxide.